Method of making magnetoresistive random access memory device

ABSTRACT

A method of making a magnetoresistive random access memory (MRAM) device includes forming a bottom conductive layer. The method includes forming an anti-ferromagnetic layer over the bottom conductive layer and forming a tunnel layer over the anti-ferromagnetic layer. The method includes forming a free magnetic layer, having a magnetic moment aligned in a direction that is adjustable by applying an electromagnetic field, over the tunnel layer, wherein the anti-ferromagnetic layer, the tunnel layer and the free magnetic layer are part of a magnetic tunnel junction (MTJ) unit. The method includes forming a top conductive layer over the free magnetic layer. The method includes performing at least one lithographic process to remove portions of the bottom conductive layer, the MTJ unit and the top conductive layer that is uncovered by a photoresist layer. The method includes removing a portion of a sidewall of the MTJ unit.

RELATED APPLICATION

This application is a divisional application of U.S. application Ser.No. 13/452,230, filed Apr. 20, 2012, which is hereby incorporated byreference in its entirety.

BACKGROUND

The present disclosure relates generally to magnetoresistive randomaccess memory (MRAM), and more particularly to MRAM cells havingmagnetic tunnel junction (MTJ) units with continuous tunnel layers.

MRAM is a type of memory device containing an array of MRAM cells thatstore data using resistance values instead of electronic charges. EachMRAM cell includes a magnetic tunnel junction (MTJ) unit whoseresistance can be adjusted to represent a logic state “0” or “1.” MTJ isa critical component of an MRAM device and the formation of an MTJ isimportant to any MRAM product.

Conventionally, the MTJ unit is comprised of a fixed magnetic layer, afree magnetic layer, and a tunnel layer disposed there between. Theresistance of the MTJ unit can be adjusted by changing a direction of amagnetic moment of the free magnetic layer with respect to that of thefixed magnetic layer. When the magnetic moment of the free magneticlayer is parallel to that of the fixed magnetic layer, the resistance ofthe MTJ unit is low, whereas when the magnetic moment of the freemagnetic layer is anti-parallel to that of the fixed magnetic layer, theresistance of the MTJ unit is high. The MTJ unit is coupled between topand bottom electrodes, and an electric current flowing through the MTJfrom one electrode to another can be detected to determine theresistance, and therefore the logic state of the MTJ.

FIG. 1 is a cross-sectional view of a typical MRAM cell 100 comprised ofa MTJ unit 102 coupled to a bit line 104 through a top electrode 106,and to a source/drain doped region 108 of a MOS device 116 through abottom electrode 110 and a contact 112. A write line 114 is locatedunderneath the MTJ unit 102 for generating an electromagnetic field tochange the resistance of the MTJ unit 102 during a write operation.During a read operation, the MOS device 116 is selected to pass acurrent through the bit line 104, the top electrode 106, the MTJ unit102, the bottom electrode 110, and the contact 112 to a source/draindoped region 118. A current detected at the bit line 104 is comparedwith a reference to determine whether the resistance of the MTJ unit 102represents a high or low state. Because MRAM does not utilize electriccharges for data storage, MRAM consumes less power and suffers less fromcurrent leakage than other types of memory, such as static random accessmemory (SRAM), dynamic random access memory (DRAM) and flash memory.

FIGS. 2-4 are cross-sectional views of a MTJ unit during a fabricationprocess. Referring to FIG. 2, a stack of a bottom conductive layer 202,an anti-ferromagnetic layer 204, a pinned layer 206, a tunnel layer 208,a free magnetic layer 210 and a top conductive layer 212 is formed abovea semiconductor substrate (not shown in the figure). Theanti-ferromagnetic layer 204 fixes a magnetic moment of the pinned layer206 in one direction, a magnetic moment of the free magnetic layer 210can be changed by applying external electromagnetic forces. Aphotoresistor layer 214 is formed on the top conductive layer 212 todefine a width of the MTJ unit being fabricated.

An etching processing using the photoresistor layer 214 as a mask isperformed to remove parts of the top conductive layer 212 not covered bythe photoresistor layer 214. The photoresistor layer 214 is thenstripped after the etching process reaches a top surface of the freemagnetic layer 210, resulting in a structure as depicted in FIG. 3.

Another etching process, preferably dry etching, is performed using thetop conductive layer 212 as a hard mask to remove portions of the freemagnetic layer 210, the tunnel layer 208, the pinned layer 206 and theanti-ferromagnetic layer 204 not covered by the top conductive layer 212in order to separate a MTJ unit from its neighboring units. The etchingprocess stops when at a top surface of the bottom conductive layer 202,resulting in a structure as depicted in FIG. 4.

One drawback of the conventional etching process used in forming the MTJunit is that the MTJ unit is susceptible to a short circuit reliabilityissue. The etching process is often performed in a chamber where plasmais introduced to bombard a surface of the MTJ unit being fabricated. Asa result, there may be residual conductive materials remaining onsidewalls of the completed MTJ unit as depicted in FIG. 4. Theseresidual conductive materials may conduct a current between the bottomconductive layer 202 and the top conductive layer 212 bypassing thetunnel layer 208, thereby causing the MTJ unit to fail.

Another drawback of the conventional etching process used in forming theMTJ unit is that the top conductive layer 212 and the photoresistorlayer 214 are thick. The MTJ unit is relatively deep for purposes ofetching as it is comprised of layers including the free magnetic layer210, the tunnel layer 208, the pinned layer 206, and theanti-ferromagnetic layer 204. Because the top conductive layer 212 actsas a hard mask the top conductive layer 212 is consumed during theetching process. The top conductive layer 212 is sufficiently thick toensure that enough of the top conductive layer 212 will remain on thefree magnetic layer 210 after the etching. Likewise, the photoresistorlayer 214 is sufficiently thick to ensure that enough of thephotoresistor layer 214 will remain on the top conductive layer 212after etching. This poses a challenge to MRAM fabrication, especiallywhen MRAM continues to shrink in size beyond 45 nm of conductor width.

Yet another drawback of the conventional etching process in forming theMTJ unit is that the top surface of the top conductive layer 212 maybecome rounded by the etching, thereby increasing the difficulty offorming a contact thereon. During the etching process, the corners ofthe top conductive layer 212 are etched faster than other parts. As aresult, properly forming a contact on the conductive layer 212 is moredifficult, and thus increases reliability issues.

As such, what is needed is a method of fabricating MRAM that addressesthe short circuit and mask thickness issues present in the conventionalprocess.

SUMMARY

The present disclosure is directed to MRAM technology. One embodimentincludes a method for fabricating a magnetoresistive random accessmemory (MRAM) device having a plurality of memory cells. The methodincludes forming a fixed magnetic layer having magnetic moments fixed ina predetermined direction; forming a tunnel layer over the fixedmagnetic layer; forming a free magnetic layer, having magnetic momentsaligned in a direction that is adjustable by applying an electromagneticfield, over the tunnel layer; forming a hard mask on the free magneticlayer partially covering the free magnetic layer; and unmagnetizingportions of the free magnetic layer uncovered by the hard mask fordefining one or more magnetic tunnel junction (MTJ) units.

The construction and method of operation together with additionalobjectives and advantages thereof will be best understood from thefollowing description of specific embodiments when read in connectionwith the accompanying drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a cross-sectional view of a typical MRAM cell.

FIGS. 2-4 are cross-sectional views of an MTJ unit during a conventionalfabrication process.

FIGS. 5-7 are cross-sectional views of an MTJ unit during a fabricationprocess in accordance with at least one embodiment.

FIG. 8 and FIG. 9 are cross-sectional views of two neighboring MRAMcells fabricated in accordance with at least one embodiment.

DESCRIPTION

This disclosure is directed to a method of fabricating a MRAM device.The following merely illustrates various embodiments of the presentinvention for purposes of explaining the principles thereof. It isunderstood that those skilled in the art will be able to devise variousequivalents that, although not explicitly described herein, embody theprinciples of this invention.

FIGS. 5-7 are cross-sectional views of an MTJ unit during a fabricationprocess of a MRAM device in accordance with at least one embodiment.Referring to FIG. 5, a stack of a bottom conductive layer 402, ananti-ferromagnetic layer 404, a pinned layer 406, a tunnel layer 408, afree magnetic layer 410 and a top conductive layer 412 is formed above asemiconductor substrate (not shown in the figure). Theanti-ferromagnetic layer 404 fixes a magnetic moment of the pinned layer406 in one direction, whereas a magnetic moment of the free magneticlayer 410 can be changed by applying external electromagnetic forces. Aphotoresistor layer 414 is formed on the top conductive layer 412 todefine a width of the MTJ unit.

The stack of bottom conductive layer 402, anti-ferromagnetic layer 404,pinned layer 406, tunnel layer 408, free magnetic layer 410 and topconductive layer 412 can be formed by semiconductor processingtechnology such as chemical vapor deposition (CVD); plasma enhancedchemical vapor deposition (PECVD), sputtering, or electroplating. Thetop and bottom conductive layers 412 and 402 contain materials, such astantalum, aluminum, copper, titanium, tungsten, TiN, or TaN. The tunnellayer contains, for example, Al₂O₃, MgO, TaOx, or HfO. The photoresistorlayer 414 can be formed by photolithography including photoresistorcoating, exposing, baking, and developing.

A reactive ion etching is performed using carbon tetrafluoride asreactants to remove portions of the top conductive layer 412 not coveredby the photoresistor layer 414 until the free magnetic layer 410underlying the top conductive layer 412 is exposed. The photoresistorlayer 414 is then removed resulting in a structure as depicted in FIG.6. Thereafter, another etching process is conducted, using the topconductive layer 412 as a hard mask, to remove portions of the freemagnetic layer 410, the tunnel layer 408, the pinned layer 406, theanti-ferromagnteic layer 404, until the bottom conductive layer 402 isexposed. This second etching process forms an MTJ unit that is depictedin FIG. 7.

Referring to FIG. 8, a sidewall-removal process is performed to removeportions of sidewalls of the MTJ unit between the top conductive layer412 and the bottom conductive layer 402. The removal of the MTJsidewalls can be done using a dry etching process, such as a plasmaetching process. The removal of the MTJ sidewalls can also be done usinga wet etching method.

Various dry etching processes involving the use of gaseous plasmas areknown. In at least one embodiment, for example, the MTJ unit is dryetched by using plasma containing a gas comprising fluorine. In at leastone embodiment, the plasma etching uses a gas mixture comprising sulfurhexafluoride (SF6), oxygen (O2)m and trifluoromethane (CHF3). A similargas mixture containing these three reactant gases has been used foretching polysilicon in a decoupled plasma source (DPS) reactor,manufactured by Applied Materials, Inc., of Santa Clara, Calif. Theplasma gas in at least one embodiment comprises a gas mixture offluoride (such as CFHx, SFx), Argon, alcohol (such as methanol),nitrogen, hydrogen, and oxygen. In at least one embodiment, the Argongas flow rates for the main etch step is between 20 to 100 sccm. Asuitable radio frequency with a power of about between 100 to 500 W isapplied. The plasma chamber pressure is maintained at approximately 3 to20 mTorr. In at least one embodiment, the nitrogen gas flow rate isbetween 50 to 200 sccm; the power is set at between 300 to 3000 W, andthe plasma chamber pressure is maintained at approximately 2 to 30mTorr.

In addition to plasma etching, other dry etching methods can be used aswell. For example, ion beam etching is another dry etching option thatcan be used to remove MTJ sidewalls. One such method, known as ionmilling, is described here as an example. Wafers are placed on a holderin a vacuum chamber and a stream of argon gas is introduced into thechamber. Upon entering the chamber, the argon is subjected to a streamof high-energy electrons from a set of cathode and anode electrodes. Theelectrons ionize the argon atoms to a high-energy state having apositive charge. The wafers are held on a negatively biased holder thatattracts the positive argon ions. As the argon ions travel to the waferholder the argon ions accelerate, picking up energy. At the wafersurface the argon ions crash into the exposed wafer layer and removesmall amounts of material from a wafer surface. During this process, nochemical reaction occurs between the argon ions and the wafer material.Material removal (etching) using ion milling is highly directional.

In addition to dry etching, the MTJ sidewall material can also beremoved by using a wet etching process. In some embodiments, inorganiccleaning solutions, such as HF, APM, SPM, HNO3 or acetic acid can beused as wet etchants. For example, a concentration of a wet etchantchemical, such as HF, can be from about 0.02% to about 1%. And anoperating temperature for the wet etching process can be from 20 to 60Celsius. The wet etching process can also be conducing as a solventcleaning solution. In at least one embodiment, the solvent cleaningsolution comprises of a mixture of a surfactant, a chelating agent, aninhibitor and water.

FIG. 8 depicts the resultant MTJ unit after a portion of the sidewallshas been removed by the etching processes described above. As FIG. 8depicts, after the damaged portion of the MTJ sidewall has been removed,the diameter of the portion of the MTJ unit below the top conductivelayer 412 is smaller than the diameter of the conductive layer 412.

FIG. 9 is a cross-sectional view of the MTJ unit after a capping later413 is placed encapsulating the MTJ unit. In at least one embodiment,the capping layer 413 is made of NiFeHf and has a thickness from about15 to 50 Angstroms. In some embodiments, the capping layer has athickness of 45 Angstroms. By employing the capping layer 413 comprisedof a NiFeHf layer that contacts the conductive layer 412, the conductivelayer 412 is less oxygen contaminated and has higher conductivity,thereby improving micro-electromechanical system (MEMS) resistance ratioΔR/R. The oxygen gettering capability of NiFeHf is achieved because Hfhas a higher oxidation potential than Ni and Fe in the top conductivelayer 412. Another benefit of a NiFeHf capping layer 413 is that a “deadlayer” between the top conductive layer 412 and the capping layer 413 issubstantially eliminated. The “dead layer” is a 3 to 6 Angstrom thickinterface between the top conductive layer 412 and the capping layer 413wherein some intermixing of layers has occurred. For example, inconventional Ru or Ta capping layers, Ru and Ta may migrate into a NiFefree layer and thereby reduce the magnetic moment of the free layer anddR/R of the MTJ. The “dead layer” is indicative of poor lattice matchingbetween the free layer and adjoining the capping layer. By reducing thedead layer and thereby increasing the effective volume of the freelayer, the NiFeHf layer promotes a more thermally stable device sincevolume of the free layer is directly related to the thermal stabilityfactor. In at least one embodiment, the capping layer 413 can be madefrom other NiFeM materials, where M is a metal such as Zr or Nb that hasan oxidation potential greater tan that of Ni and Fe.

In at least one embodiment, the capping layer 413 may be a compositelayer having a NiFeHf layer that contacts the NiFe free layer, and oneor more other layers formed on the NiFeHf layer. In at least oneembodiment, the capping layer 413 may have a NiFeHf/Ta configuration.Optionally, the capping layer 413 may have a configuration representedby NiFeHf/Ta/Ru. In at least one embodiment, a thickness of the Ta layermay vary from 10 to 50 Angstroms, and a thickness of the Ru layer mayvary from 30 to 100 Angstroms. Optionally, other elements such as Zr orNb that have a higher oxidation potential than Ni and Fe may beincorporated in a NiFeM/Ta capping layer configuration.

After all of the MTJ layers have been formed, a hard mask having athickness of from 400 to 600 Angstroms is deposited on the capping layer413 in the same sputter deposition tool. In some embodiments, the hardmask has a thickness of 500 Angstroms. In at least one embodiment, a Tahard mask is formed on the NiFeHf capping layer 413.

One advantage of the method for fabricating the MRAM devices is that thereliability of the memory structure resulted from such method can beimproved as opposed to the structure made by the conventionalmanufacturing process. As discussed above, the method eliminates theetching process during the construction of MTJ units, and thereforeavoids the material residue problem that is often seen on the sidewallsof the MTJ units made by conventional methods. This eliminates the shortcircuit problems for MTJ units, and therefore improves the reliabilityof the MRAM devices.

The above disclosure provides many different embodiments or embodimentsfor implementing different features of the invention. Specificembodiments of components and processes are described to help clarifythe invention. These are, of course, merely embodiments and are notintended to limit the invention from that described in the claims.

An aspect of this description relates to a method of making amagnetoresistive random access memory (MRAM) device. The method includesforming a bottom conductive layer. The method further includes formingan anti-ferromagnetic layer. The method further includes forming atunnel layer over the bottom conductive layer and the anti-ferromagneticlayer. The method further includes forming a free magnetic layer, havinga magnetic moment aligned in a direction that is adjustable by applyingan electromagnetic field, over the tunnel layer, wherein theanti-ferromagnetic layer, the tunnel layer and the free magnetic layerare part of a magnetic tunnel junction (MTJ) unit. The method furtherincludes forming a top conductive layer over the free magnetic layer.The method further includes performing at least one lithographic processto remove portions of the bottom conductive layer, theanti-ferromagnetic layer, the tunnel layer, the free magnetic layer andthe top conductive layer that is uncovered by a photoresist layer untilthe bottom conductive layer is exposed. The method further includesremoving a portion of a sidewall of the MTJ unit. In some embodiments,the method further includes forming a capping layer, after the portionof the sidewall of the MTJ unit is removed, on the MTJ unit toencapsulate the MTJ unit. In some embodiments, the method furtherincludes forming a hard mask over the capping layer. In someembodiments, forming the capping layer includes forming the cappinglayer having a thickness ranging from about 15 angstroms (Å) to about 50Å. In some embodiments, forming the capping layer includes forming thecapping layer directly contacting a bottom surface of the top conductivelayer. In some embodiments, removing the portion of the sidewall of theMTJ unit includes using a dry etching process. In some embodiments,removing the portion of the sidewall of the MTJ unit includes using awet etching process. In some embodiments, the method further includesforming a pinned layer over the anti-ferromagnetic layer, wherein thepinned layer is part of the MTJ unit. In some embodiments, removing theportion of the sidewall of the MTJ unit includes undercutting the topconductive layer.

An aspect of this description relates to a method of making amagnetoresistive random access memory (MRAM) device. The method includesdepositing an anti-ferromagnetic layer over a first conductive layer.The method further includes depositing a pinned layer over theanti-ferromagnetic layer. The method further includes depositing atunnel layer over the pinned layer. The method further includesdepositing a free magnetic layer over the tunnel layer. The methodfurther includes depositing a second conductive layer over the freemagnetic layer. The method further includes patterning theanti-ferromagnetic layer, the pinned layer, the tunnel layer, the freemagnetic layer and the second conductive layer to have alignedsidewalls. The method further includes etching the anti-ferromagneticlayer, the pinned layer, the tunnel layer and the free magnetic layer tohave sidewalls recessed with respect to sidewalls of the secondconductive layer. The method further includes depositing a capping layeralong the recessed sidewalls of the anti-ferromagnetic layer, the pinnedlayer, the tunnel layer and the free magnetic layer. In someembodiments, depositing the capping layer includes encapsulating thesecond conductive layer. In some embodiments, patterning the secondconductive layer includes forming a curved top surface of the secondconductive layer. In some embodiments, depositing the second conductivelayer includes depositing the second conductive layer selected form thegroup consisting of tantalum, aluminum, copper, titanium, tungsten, TiNand TaN. In some embodiments, depositing the tunnel layer comprisesdepositing the tunnel layer comprising Al₂O₃, MgO, TaO_(x) or HfO. Insome embodiments, patterning the second conductive layer includesperforming a reactive ion etching. In some embodiments, etching theanti-ferromagnetic layer, the pinned layer, the tunnel layer and thefree magnetic layer includes performing a plasma etching process.

An aspect of this description relates to a method of making amagnetoresistive random access memory (MRAM) device. The method includesdepositing a magnetic tunnel junction (MTJ) unit over a first conductivelayer, wherein the MTJ unit includes an anti-ferromagnetic layer, apinned layer, a tunnel layer and a free magnetic layer. The methodfurther includes depositing a second conductive layer over the MTJ unit.The method further includes depositing a photoresist over the secondconductive layer. The method further includes patterning thephotoresist. The method further includes etching the second conductivelayer using the patterned photoresist. The method further includesremoving the patterned photoresist. The method further includes etchingthe MTJ unit using the etched second conductive layer. The methodfurther includes recessing sidewalls of the etched MTJ unit. The methodfurther includes depositing a capping layer along the recessed sidewallsof the etched MTJ unit. In some embodiments, etching the MTJ unitincludes using a gas mixture comprising sulfur hexafluoride, oxygen andtrifluoromethane. In some embodiments, etching the MTJ unit includesusing a gas mixture comprising a fluoride, argon, an alcohol, nitrogen,hydrogen and oxygen. In some embodiments, etching the MTJ unit includesusing an ion beam etching process.

Although the invention is illustrated and described herein as embodiedin one or more specific examples, it is nevertheless not intended to belimited to the details shown, since various modifications and structuralchanges may be made therein without departing from the spirit of theinvention and within the scope and range of equivalents of the claims.Accordingly, it is appropriate that the appended claims be construedbroadly and in a manner consistent with the scope of the invention, asset forth in the following claims.

What is claimed is:
 1. A method of making a magnetoresistive randomaccess memory (MRAM) device, the method comprising: forming a bottomconductive layer; forming an anti-ferromagnetic layer; forming a tunnellayer over the bottom conductive layer and the anti-ferromagnetic layer;forming a free magnetic layer, having a magnetic moment aligned in adirection that is adjustable by applying an electromagnetic field, overthe tunnel layer, wherein the anti-ferromagnetic layer, the tunnel layerand the free magnetic layer are part of a magnetic tunnel junction (MTJ)unit; forming a top conductive layer over the free magnetic layer;performing at least one lithographic process to remove portions of thebottom conductive layer, the anti-ferromagnetic layer, the tunnel layer,the free magnetic layer and the top conductive layer that is uncoveredby a photoresist layer until the bottom conductive layer is exposed; andremoving a portion of a sidewall of the MTJ unit.
 2. The method of claim1, further comprising forming a capping layer, after the portion of thesidewall of the MTJ unit is removed, on the MTJ unit to encapsulate theMTJ unit.
 3. The method of claim 2, further comprising forming a hardmask over the capping layer.
 4. The method of claim 2 wherein formingthe capping layer comprises forming the capping layer having a thicknessranging from about 15 angstroms (Å) to about 50 Å.
 5. The method ofclaim 2, wherein forming the capping layer comprises forming the cappinglayer directly contacting a bottom surface of the top conductive layer.6. The method of claim 1, wherein removing the portion of the sidewallof the MTJ unit comprises using a dry etching process.
 7. The method ofclaim 1, wherein removing the portion of the sidewall of the MTJ unitcomprises using a wet etching process.
 8. The method of claim 1, furthercomprising forming a pinned layer over the anti-ferromagnetic layer,wherein the pinned layer is part of the MTJ unit.
 9. The method of claim1, wherein removing the portion of the sidewall of the MTJ unitcomprises undercutting the top conductive layer.
 10. A method of makinga magnetoresistive random access memory (MRAM) device, the methodcomprising: depositing an anti-ferromagnetic layer over a firstconductive layer; depositing a pinned layer over the anti-ferromagneticlayer; depositing a tunnel layer over the pinned layer; depositing afree magnetic layer over the tunnel layer; depositing a secondconductive layer over the free magnetic layer; patterning theanti-ferromagnetic layer, the pinned layer, the tunnel layer, the freemagnetic layer and the second conductive layer to have alignedsidewalls; etching the anti-ferromagnetic layer, the pinned layer, thetunnel layer and the free magnetic layer to have sidewalls recessed withrespect to sidewalls of the second conductive layer; depositing acapping layer along the recessed sidewalls of the anti-ferromagneticlayer, the pinned layer, the tunnel layer and the free magnetic layer.11. The method of claim 10, wherein depositing the capping layercomprises encapsulating the second conductive layer.
 12. The method ofclaim 10, wherein patterning the second conductive layer comprisesforming a curved top surface of the second conductive layer.
 13. Themethod of claim 10, wherein depositing the second conductive layercomprises depositing the second conductive layer selected from the groupconsisting of tantalum, aluminum, copper, titanium, tungsten, TiN andTaN.
 14. The method of claim 10, wherein depositing the tunnel layercomprises depositing the tunnel layer comprising Al₂O₃, MgO, TaO_(x) orHfO.
 15. The method of claim 10, wherein patterning the secondconductive layer comprises performing a reactive ion etching.
 16. Themethod of claim 10, wherein etching the anti-ferromagnetic layer, thepinned layer, the tunnel layer and the free magnetic layer comprisesperforming a plasma etching process.
 17. A method of making amagnetoresistive random access memory (MRAM) device, the methodcomprising: depositing a magnetic tunnel junction (MTJ) unit over afirst conductive layer, wherein the MTJ unit comprises ananti-ferromagnetic layer, a pinned layer, a tunnel layer and a freemagnetic layer; depositing a second conductive layer over the MTJ unit;depositing a photoresist over the second conductive layer; patterningthe photoresist; etching the second conductive layer using the patternedphotoresist; removing the patterned photoresist; etching the MTJ unitusing the etched second conductive layer; recessing sidewalls of theetched MTJ unit; and depositing a capping layer along the recessedsidewalls of the etched MTJ unit.
 18. The method of claim 17, whereinetching the MTJ unit comprises using a gas mixture comprising sulfurhexafluoride, oxygen and trifluoromethane.
 19. The method of claim 17,wherein etching the MTJ unit comprises using a gas mixture comprising afluoride, argon, an alcohol, nitrogen, hydrogen and oxygen.
 20. Themethod of claim 17, wherein etching the MTJ unit comprises using an ionbeam etching process.